Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 4, 2007
Patent Application Number
11266333
Date Filed
November 4, 2005
Patent Primary Examiner
Patent abstract
Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane series; for example, diamantane, triamantane, tetramantane, pentamantane, hexamantane, etc. The diamondoid-containing pendant group may have hydrophilic-enhancing substituents such as a hydroxyl group, and may contain a lactone group. Advantages of the present compositions include enhanced resolution, sensitivity, and adhesion to the substrate.
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