Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Satoshi Watanabe0
Youichi Ohsawa0
Ryuji Koitabashi0
Date of Patent
December 25, 2007
0Patent Application Number
115830410
Date Filed
October 19, 2006
0Patent Primary Examiner
Patent abstract
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high contrast of dissolution of resist film, a high resolution, and good storage stability.
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