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US Patent 7312974 Electrostatic chuck

Patent 7312974 was granted and assigned to Kyocera Corporation on December, 2007 by the United States Patent and Trademark Office.

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US Patent 12125673 Pulsed voltage source for plasma processing applications

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US Patent 12111341 In-situ electric field detection method and apparatus

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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber

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US Patent 11984306 Plasma chamber and chamber component cleaning methods

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US Patent 11972924 Pulsed voltage source for plasma processing applications

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US Patent 11967483 Plasma excitation with ion energy control

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US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing

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US Patent 11887813 Pulsed voltage source for plasma processing

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US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing

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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power

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US Patent 11776788 Pulsed voltage boost for substrate processing

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Patent Inventor Names

Kazuhiro Kuchimachi0

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Patent abstract

The electrostatic chuck includes: a conductive base formed of metal or both metal and ceramics, serving as a chucking electrode; and an insulating film formed on one principal plane of the conductive base, the top face of the insulating film serving as a placing surface for placing a wafer; wherein the insulating film is formed of a uniform amorphous ceramics of an oxide and has a thickness in a range of 10 to 100 μm, thereby preventing cracking and insulation breakdown in the insulating film and improving characteristics of releasing the wafer.

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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform

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US Patent 11694876 Apparatus and method for delivering a plurality of waveform signals during plasma processing

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US Patent 07312974 Electrostatic chuck US Patent 7312974 Electrostatic chuck

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Patent Number

073129740

Patent Number

73129740

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=073129740

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Is a

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Current Assignee

Kyocera Corporation

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

073129740

Date of Patent

December 25, 2007

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Patent Application Number

108537730

Date Filed

May 25, 2004

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=073129740

Patent Primary Examiner

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Website URL

https://pdfpiw.uspto.gov/.piw?Docid=07312974

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