US Patent 7314690 Photomask producing method and photomask blank
Patent 7314690 was granted and assigned to Hoya on January, 2008 by the United States Patent and Trademark Office.
Is a
Current Assignee
0
Date Filed
April 9, 2004
0
Date of Patent
January 1, 2008
0
Patent Application Number
10820785
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Patent Inventor Names
Mutsumi Hara
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Yasushi Okubo
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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