Patent attributes
The present invention provides novel compounds which are useful for the production of fluorinated adamantane derivatives excellent in etching resistance and useful as photolithographic material and so on. Namely, the present invention provides compounds represented by the following formulae (3) and (4):A(-G-Q-R)n (3)Af(-Gf-Q-Rf)n (4)provided that the symbols in the formula have the following meanings:A: a n-valent group having n hydrogen atoms of adamantane converted to connecting bonds, wherein hydrogen atoms not converted to connecting bonds, may be each substituted by an alkyl group,R: a fluorinated monovalent organic group,n: an integer of from 1 to 4,G: —CH2— or a single bond,Q: —COO— or —OCO—,Af: a n-valent group (A) having n hydrogen atoms bonded to carbon atoms of adamantane converted to connecting bonds, wherein hydrogen atoms not converted to connecting bonds, may be each substituted by an alkyl group, in which at least one of hydrogen atoms forming C—H bonds is substituted by a fluorine atom,Rf: a fluorinated monovalent organic group,Gf: —CF2— or a single bond.
