Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Paul Van Der Veen0
Date of Patent
January 1, 2008
0Patent Application Number
109750370
Date Filed
October 28, 2004
0Patent Primary Examiner
Patent abstract
The invention relates to a lithographic apparatus and a device manufacturing method. The lithographic apparatus is of the scanning type, in which a radiation beam effectively scans across a surface of a substrate. The apparatus comprises a beam attenuator, e.g. in the form of a filter, having an attenuation value profile that varies as a function of position along the scanning direction. Appropriate selection of the attenuation value profile allows the illumination of the substrate to be more homogeneous, since e.g. received dose effects due to pulse to pulse variations in a pulsed illumination source are much better averaged out.
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