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US Patent 7321426 Optical metrology on patterned samples

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
June 2, 2004
Date of Patent
January 22, 2008
Patent Application Number
10859637
Patent Citations Received
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US Patent 12085515 Methods and systems for selecting wafer locations to characterize cross-wafer variations based on high-throughput measurement signals
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US Patent 11990380 Methods and systems for combining x-ray metrology data sets to improve parameter estimation
0
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US Patent 12019030 Methods and systems for targeted monitoring of semiconductor measurement quality
0
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US Patent 12025575 Soft x-ray optics with improved filtering
0
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US Patent 11955308 Water cooled, air bearing based rotating anode x-ray illumination source
0
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US Patent 11955391 Process monitoring of deep structures with X-ray scatterometry
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7321426
Patent Primary Examiner
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Gregory J. Toatley, Jr

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