Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chun-Chung Huang0
Date of Patent
January 22, 2008
Patent Application Number
10908783
Date Filed
May 26, 2005
Patent Primary Examiner
Patent abstract
An anti-reflection coating layer is formed between an under layer and a photoresist layer. The anti-reflection coating is characterized in a refraction value (n) of the anti-reflection coating layer, wherein n is a constant, and an extinction coefficient (k) of the anti-reflection coating layer, increasing in gradient toward the under layer. Thus, the substrate reflectivity with respect to different under layers can be substantially equal to 0 by controlling the k of the anti-reflection coating layer.
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