US Patent 7323277 Photomask
Patent 7323277 was granted and assigned to Sony on January, 2008 by the United States Patent and Trademark Office.
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Patent abstract
A photomask is proposed which comprises a transparent substrate and a light shielding film formed on a principal surface of the substrate, with the light shielding film having an aperture pattern thereon. And, a recess is provided at the portion of the transparent substrate which is exposed in the bottom of the aperture pattern. The dimension of the recess is larger than that of the aperture, and a peripheral portion of each of the aperture pattern of the light shielding film is configured as an eaves-like extension in response to the density of a neighboring pattern of the aperture pattern.
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US Patent 07323277 Photomask US Patent 7323277 Photomask
Infobox
Patent Number
0732327700
Patent Number
732327700
Edits on 27 Mar, 2023
Golden AI
Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
073232770
Date of Patent
January 29, 2008
0Patent Application Number
109389890
Date Filed
September 10, 2004
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
Golden AI
Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
073232770
Date of Patent
January 29, 2008
0Patent Application Number
109389890
Date Filed
September 10, 2004
0Official Website
Patent Primary Examiner
Edits on 17 Jun, 2022
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US Patent 07323277 Photomask
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07323277
Date of patent
January 29, 2008
Patent application number
10938989
Date Filed
September 10, 2004
Patent primary examiner
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