Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Liviu Valer Raulea0
Date of Patent
February 5, 2008
0Patent Application Number
108537220
Date Filed
May 26, 2004
0Patent Primary Examiner
Patent abstract
A device manufacturing method for a substrate of a batch of substrates includes conveying the substrate to an exposing position of a lithographic apparatus, exposing the substrate at the exposing position to a beam of radiation of the lithographic apparatus, and conveying the exposed substrate from the exposing position toward a processing position configured to process the exposed substrate, wherein a start time for the exposing of the substrate is varied so as to control that a time interval between the end of the exposing of the substrate at the exposing position and the start of processing of the substrate at the processing position for the substrate is substantially the same as for each other substrate in the batch of substrates.
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