Patent attributes
A method for stripping a photo-resist includes the steps of: (a) wet stripping a photo-resist off from a substrate; and (b) rinsing the substrate under high-speed conveyance using an aqua knife. A speed of the conveyance of the substrate is 0.2 m/s or higher. Because the aqua knife can rinse the stripping solvent and the reaction product in the stripping step remained on the substrate that can erode an aluminum film below the photo-resist, aluminum erosion is significantly reduced. In addition, the substrate is conveyed in a high speed, such that the rinsing step is transient. Therefore, the aluminum erosion issued in the rinsing step is little. Moreover, there is no need for an isopropyl alcohol rinsing step or a carbon dioxide rinsing step. Thus, the method has increased yield and reduced cost. A related apparatus is also provided.
