US Patent 7329616 Substrate processing apparatus and substrate processing method

Patent 7329616 was granted and assigned to Tokyo Electron on February, 2008 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Tokyo Electron

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

73296160

Patent Inventor Names

Masaru Amai0

Takehiko Orii0

Date of Patent

February 12, 2008

Patent Application Number

113273100

Date Filed

January 9, 2006

Patent Primary Examiner

‌

Laura M. Schillinger

Patent abstract

A substrate processing apparatus and a substrate processing method are provided wherein an oxide film which is thinner than the conventional films can be formed with uniform thickness when forming an oxide film on the front-side surface of a substrate.

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