US Patent 7332250 Photomask
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Patent Inventor Names
Akio Misaka0
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Patent abstract
The photomask of this invention includes, on a transparent substrate, a semi-shielding portion having a transmitting property against exposing light, a transparent portion having a transmitting property against the exposing light and surrounded with the semi-shielding portion, and an auxiliary pattern surrounded with the semi-shielding portion and provided around the transparent portion. The semi-shielding portion and the transparent portion transmit the exposing light in an identical phase with respect to each other. The auxiliary pattern transmits the exposing light in an opposite phase with respect to the semi-shielding portion and the transparent portion and is not transferred through exposure.
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US Patent 07332250 Photomask US Patent 7332250 Photomask
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Patent Number
073322500
Patent Number
73322500
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Official Website
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Patent Jurisdiction
Patent Number
073322500
Date of Patent
February 19, 2008
0Patent Application Number
108245290
Date Filed
April 15, 2004
0Official Website
Patent Primary Examiner
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US Patent 07332250 Photomask
Infobox
Is a
Patent jurisdiction
Patent number
07332250
Date of patent
February 19, 2008
Patent application number
10824529
Date Filed
April 15, 2004
Patent primary examiner
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