Patent attributes
Disclosed are methods for producing an interlaced device or composition which includes at least a first and a second interlaced element. Each interlaced element includes a mated first and second part, the first part having two termini and the second part having two termini, and a defined central void through which the other interlaced element passes. The method includes the processing and mating of a first and a second substrate layer, each including a top surface, a bottom surface and a mating zone. The first substrate layer includes a portion corresponding to a first part of a first interlaced element and a first part of a second interlaced element. The second substrate layer includes a portion corresponding to a second part of a first interlaced element and a second part of a second interlaced element. Also disclosed are interlaced devices or compositions.
