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US Patent 7334588 Method and apparatus for wafer cleaning

Patent 7334588 was granted and assigned to Applied Materials on February, 2008 by the United States Patent and Trademark Office.

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Patent abstract

An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.

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