Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tomoki Nagai0
Yuuji Yada0
Daisuke Shimizu0
Kentarou Gotou0
Date of Patent
February 26, 2008
0Patent Application Number
112351010
Date Filed
September 27, 2005
0Patent Primary Examiner
Patent abstract
A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiation transmittance as a chemically amplified positive-tone resist effectively responding to active radiation, particularly to deep ultraviolet rays, effectively controlling line width variation in resist patterns due to fluctuation in the resist film thickness on a highly refractive substrate, and exhibiting excellent focal depth allowance.
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