Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
March 11, 2008
Patent Application Number
11127328
Date Filed
May 11, 2005
Patent Citations Received
Patent Primary Examiner
Patent abstract
A plasma source is described. The source includes a reactive impedance element formed from a plurality of electrodes. By providing such a plurality of electrodes and powering adjacent electrodes out of phase with one another, it is possible to improve the characteristics of the plasma generated.
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