Patent attributes
A cleaning device for use in a semiconductor processing. The device comprises a substrate supporter for supporting a substrate to be cleaned, a scrub pad mounting plate, and a chuck coupling to the substrate supporter and the scrub pad mounting plate. The chuck is configured to move the substrate supporter and the scrub pad mounting plate. The device further comprises a scrub pad mountable to and moveable from the scrub pad mounting plate. The scrub pad, when mounted to the scrub pad mounting plate, is higher than the substrate when mounted on the substrate supporter. The scrub pad mounting plate and the substrate supporter can both be coupled to the chuck so that the chuck moves both the scrub pad mounting plate and the substrate supporter in one action.
