Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 25, 2008
Patent Application Number
10841186
Date Filed
May 7, 2004
Patent Primary Examiner
Patent abstract
A method is disclosed for repairing an attenuated phase shift mask. The mask initially has a mask substrate coated with a predetermined shift layer material, a mask pattern layer, and an energy beam resist layer sequentially. After forming a predetermined mask pattern in the mask pattern layer through an energy beam resist layer, the mask is inspected for detecting at least one missing pattern in the mask pattern layer. The predetermined mask pattern is repaired in a predetermined defect area for correcting the missing pattern. After the missing pattern is reformed. The predetermined mask pattern is transferred in the shift layer material.
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