Patent 7348129 was granted and assigned to Tokyo Electron on March, 2008 by the United States Patent and Trademark Office.
An organic material film formed on a surface of an object to be processed is cured by electron beams irradiated thereon through a hydrocarbon radical generating gas. By employing the electron beams and the hydrocarbon radical generating gas, a deterioration of a k value of the organic material film and a reduction of a chemical resistance thereof are suppressed.