Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Andreas Wurmbrand0
Bob Streefkerk0
Christiaan Alexander Hoogendam0
Erik Roelof Loopstra0
Bernard Gellrich0
Date of Patent
April 1, 2008
Patent Application Number
10961395
Date Filed
October 12, 2004
Patent Primary Examiner
Patent abstract
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
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