Patent attributes
A Method of forming microelectromechanical optical display devices is provided. A sacrificial layer is formed above a substrate. A plurality of posts penetrating the sacrificial layer is formed. A reflective layer and a flexible layer are sequentially formed above the sacrificial layer and the posts. A photoresist layer is formed on part of the flexible layer. By performing wet etching using the photoresist layer as a mask, a portion of the flexible layer is removed to form a patterned flexible layer. The wet etching is stopped on the reflective layer. The photoresist layer is removed. By performing dry etching using the patterned flexible layer as a mask, a portion of the reflective layer is removed to form a patterned reflective layer. A mechanical layer is formed with the patterned flexible and reflective layers. The sacrificial layer is removed to release the mechanical layer.
