Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Fujimori Hayano0
Date of Patent
April 22, 2008
0Patent Application Number
117850030
Date Filed
April 13, 2007
0Patent Primary Examiner
Patent abstract
An apparatus and method analyze overlay deviation in alignment between a first mark and a second mark that are formed on a substrate. In particular, a relationship between changes in overlay deviation values and changes in focus position of the substrate for a plurality of sets of the first and second marks that are provided on the substrate is calculated, and then an output is provided from which a user can determine whether the substrate suffers from wafer-induced-shift. Preferably, the output is a vector-map showing the relationship between changes in overlay deviation values and changes in focus position of the substrate for the plurality of sets of marks.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
