Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kei Hayasaki0
Shinichi Ito0
Tatsuhiko Ema0
Tomoyuki Takeishi0
Kenji Kawano0
Date of Patent
April 29, 2008
0Patent Application Number
106245930
Date Filed
July 23, 2003
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A pattern forming method comprises forming a photosensitive resin film on a substrate, exposing the photosensitive resin film, forming a pattern of the photosensitive resin film by supplying a developing solution to the photosensitive resin film, and slimming to remove a surface layer of the pattern by causing the pattern to contact with an activated water.
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