Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Christoph Noelscher0
Roderick Koehle0
Bernd Kuechler0
Date of Patent
May 6, 2008
0Patent Application Number
112002560
Date Filed
August 9, 2005
0Patent Primary Examiner
Patent abstract
The invention relates to a method for optimizing a mask layout pattern comprising at least one structural feature. First a desired layout pattern is provided. Based on the desired layout pattern, an optimized reference diffraction coefficient is provided. After selecting an initial mask geometry having polygon-shaped structures, initial diffraction coefficients are calculated. A difference based on the reference diffraction coefficient and initial diffraction coefficients is used to optimize the initial geometry in order to provide a mask layout pattern.
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