US Patent 7371649 Method of forming carbon-containing silicon nitride layer
Patent 7371649 was granted and assigned to United Microelectronics Corporation on May, 2008 by the United States Patent and Trademark Office.
Is a
Date Filed
September 13, 2006
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Date of Patent
May 13, 2008
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Patent Application Number
11531283
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Patent Inventor Names
Po-Lun Cheng
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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