Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 13, 2008
Patent Application Number
11050312
Date Filed
February 3, 2005
Patent Primary Examiner
Patent abstract
A method for forming a semiconductor device includes forming a photoresist layer over a substrate and patterning the photoresist layer to form photoresist portions. A second layer is formed over the substrate in areas not covered by the photoresist portions and the photoresist portions are removed. After removing the photoresist portions, the second layer is used to modify the substrate to create at least a portion of the semiconductor device.
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