US Patent 7372048 Source multiplexing in lithography
Patent 7372048 was granted and assigned to Intel on May, 2008 by the United States Patent and Trademark Office.
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Patent Inventor Names
Michael Goldstein0
Peter J. Silverman0
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Patent abstract
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
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US Patent 07372048 Source multiplexing in lithography US Patent 7372048 Source multiplexing in lithography
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Patent Number
073720480
Patent Number
73720480
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Official Website
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
073720480
Date of Patent
May 13, 2008
0Patent Application Number
111962310
Date Filed
August 2, 2005
0Official Website
Patent Primary Examiner
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US Patent 07372048 Source multiplexing in lithography
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07372048
Date of patent
May 13, 2008
Patent application number
11196231
Date Filed
August 2, 2005
Patent primary examiner
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