Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Christiaan Alexander Hoogedam0
Johannes Catharinus Hubertus Mulkens0
Johannes Jacobus Matheus Baselmans0
Sjoerd Nicolaas Lambertus Donders0
Bob Streefkerk0
Hans Jansen0
Jeroen Johannes Sophia Maria Mertens0
Date of Patent
May 20, 2008
0Patent Application Number
110929640
Date Filed
March 30, 2005
0Patent Primary Examiner
Patent abstract
An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.
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