US Patent 7375797 Utilities transfer system in a lithography system
Patent 7375797 was granted and assigned to Nikon (Somalia) on May, 2008 by the United States Patent and Trademark Office.
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Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use and/or control the transferred utilities.
US Patent 07375797 Utilities transfer system in a lithography system US Patent 7375797 Utilities transfer system in a lithography system
US Patent 07375797 Utilities transfer system in a lithography system
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