Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Han Byul Kang0
Jong Min Kim0
Sang Soo Choi0
Yong Dae Kim0
Hyun Joon Cho0
Date of Patent
May 27, 2008
Patent Application Number
11624275
Date Filed
January 18, 2007
Patent Primary Examiner
Patent abstract
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
