Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
May 27, 2008
Patent Application Number
11606769
Date Filed
November 29, 2006
Patent Citations Received
Patent Primary Examiner
Patent abstract
A grid-based resist simulator predicts how a wafer coated with one or more resist layers will develop when exposed with a mask pattern. Image intensity values are calculated at a grid of points on the wafer, and the image intensity points are analyzed with a resist simulator that produces a resist surface function. A threshold contour of the resist surface function defines how the mask pattern will print on a wafer.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
