US Patent 7378224 Method for forming pattern, and optical element

Patent 7378224 was granted and assigned to JSR Corporation on May, 2008 by the United States Patent and Trademark Office.

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Patent Inventor Names

Atsushi Kumano0

Masaaki Hanamura0

Shinji Shiraki0

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Patent abstract

There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding oil-shedding region by use of a radiation sensitive resin composition and coating the pattern with a high refractive index resin solution using a solvent having low wettability to the water-shedding oil-shedding region so as to form two regions of different refractive indices.

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https://pdfpiw.uspto.gov/.piw?Docid=073782240

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