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US Patent 7384867 Formation of composite tungsten films

Patent 7384867 was granted and assigned to Applied Materials on June, 2008 by the United States Patent and Trademark Office.

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Patent abstract

Methods for the deposition of tungsten films are provided. The methods include depositing a nucleation layer by alternatively adsorbing a tungsten precursor and a reducing gas on a substrate, and depositing a bulk layer of tungsten over the nucleation layer.

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