Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 17, 2008
Patent Application Number
10550753
Date Filed
March 24, 2004
Patent Primary Examiner
Patent abstract
A metal atomic layer and an oxygen atomic layer are formed in this order by ALD, followed by rapid heating through RTA (Rapid Thermal Annealing). This cycle of steps is repeated to form a high dielectric constant film.
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