Patent 7387864 was granted and assigned to E.I. Du Pont De Nemours And Company on June, 2008 by the United States Patent and Trademark Office.
A donor element useful in an assemblage for imaging by exposure to light comprises a support layer formed by a stretching process, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The light-to-heat conversion layer is coated on the support prior to completion of the stretching process.