Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Keun Do Ban0
Ki Lyoung Lee0
Sa Ro Han Park0
Date of Patent
July 8, 2008
0Patent Application Number
116176920
Date Filed
December 28, 2006
0Patent Primary Examiner
Patent abstract
A method for manufacturing a semiconductor device includes forming a second storage node contact hole with a mask for storage node and securing an overlay margin between a storage node contact hole and a storage node with a hard mask layer that serves as a hard mask as well as an anti-reflection film to reduce contact resistance, prevent reduction of a line-width of a lower interlayer insulating film and eliminate processes for depositing the interlayer insulating film and a polysilicon layer and etching the polysilicon layer to reduce a production period and cost of products.
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