Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Toshitaka Hiraga0
Tetsuo Aoyama0
Tomoko Suzuki0
Date of Patent
July 15, 2008
0Patent Application Number
108263190
Date Filed
April 19, 2004
0Patent Primary Examiner
Patent abstract
The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageously provide both cleaning efficiency and material compatibility.
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