Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 15, 2008
Patent Application Number
10436595
Date Filed
May 12, 2003
Patent Citations Received
Patent Primary Examiner
Patent abstract
A microfabricated diffusion source to provide for a controlled diffusion rate of a vapor comprises a porous reservoir formed in a substrate that can be filled with a liquid, a headspace cavity for evaporation of the vapor therein, a diffusion channel to provide a controlled diffusion of the vapor, and an outlet to release the vapor into a gas stream. The microfabricated diffusion source can provide a calibration standard for a microanalytical system. The microanalytical system with an integral diffusion source can be fabricated with microelectromechanical systems technologies.
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