US Patent 7399579 Fabrication of metallic microstructures via exposure of photosensitive composition
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Patent Inventor Names
Francisco Arias0
George M. Whitesides0
Paul J. A. Kenis0
Rustem F. Ismagilov0
Tao Deng0
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Patent abstract
A method of forming microstructures. An article including a metal atom precursor is disproportionally exposed to electromagnetic radiation in an amount and intensity sufficient to convert some of the precursor to elemental metal. Additional conductive material may then be deposited onto the elemental metal to produce a microstructure.
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US Patent 07399579 Fabrication of metallic microstructures via exposure of photosensitive composition US Patent 7399579 Fabrication of metallic microstructures via exposure of photosensitive composition
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Patent Number
07399579
Patent Number
7399579
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Official Website
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US Patent 07399579 Fabrication of metallic microstructures via exposure of photosensitive composition
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Is a
Patent jurisdiction
Patent number
07399579
Date of patent
July 15, 2008
Patent application number
10763819
Date Filed
January 23, 2004
Patent primary examiner
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