US Patent 7399711 Method for controlling a recess etch process
Patent 7399711 was granted and assigned to Lam Research on July, 2008 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
November 1, 2002
Date of Patent
July 15, 2008
Patent Application Number
10286409
Patent Citations Received
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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