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Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yong Wang0
Han-Ting Chang0
Isao Nishimura0
Kenji Okamoto0
Adam Safir0
Didier Benoit0
Dominique Charmot0
Date of Patent
July 15, 2008
0Patent Application Number
117344740
Date Filed
April 12, 2007
0Patent Primary Examiner
Patent abstract
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
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