Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 15, 2008
Patent Application Number
10899318
Date Filed
July 26, 2004
Patent Primary Examiner
Patent abstract
An apparatus for measuring an exposure intensity on a wafer is disclosed. According to one aspect, an apparatus for measuring an exposure intensity on a wafer includes an exposure device for generating a radiation having a predetermined wavelength. Further, the apparatus includes a mask at a first predetermined distance from the exposure device for patterned exposure of a wafer A detection device detects the exposure intensity at a second predetermined distance from the exposure device. A compensation device can be moved into the beam path between the exposure device and the detection device for the purpose of influencing the beam path.
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