Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hiroaki Tanaka0
Date of Patent
July 29, 2008
0Patent Application Number
111746220
Date Filed
July 6, 2005
0Patent Primary Examiner
Patent abstract
A photoresist pattern is formed on an insulating substrate so that it has a reverse tapered cross section and a reverse pattern of a wiring pattern to be formed. Next, a nanoparticles-containing ink is injected on a wiring region using an inkjet system, followed by a leveling process, a drying process, a resist separation process and a baking process. Thus a wiring pattern is formed.
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