Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Vladimir I. Kuznetsov0
Xavier Pages0
Gert-Jan Snijders0
Herbert Terhorst0
Pascal G. Vermont0
Ernst H. A. Granneman0
Date of Patent
August 12, 2008
0Patent Application Number
113566970
Date Filed
February 17, 2006
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A substrate undergoes a semiconductor fabrication process at different temperatures in a reactor without changing the temperature of the reactor. The substrate is held suspended by flowing gas between two heated surfaces of the reactor. Moving the two heated surfaces in close proximity with the substrate for a particular time duration heats the substrate to a desired temperature. The desired temperature is then maintained by distancing the heated surfaces from the substrate and holding the heated surface at the increased distance to minimize further substrate heating.
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