US Patent 7410544 Method for cleaning electroless process tank
Patent 7410544 was granted and assigned to Freescale Semiconductor on August, 2008 by the United States Patent and Trademark Office.
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Patent abstract
A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid (103), after which the tank is exposed to a second acid in the presence of a first oxidizing agent (107).
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US Patent 07410544 Method for cleaning electroless process tank US Patent 7410544 Method for cleaning electroless process tank
Infobox
Patent Number
0741054400
Patent Number
741054400
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
074105440
Date of Patent
August 12, 2008
0Patent Application Number
114083110
Date Filed
April 21, 2006
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
074105440
Date of Patent
August 12, 2008
0Patent Application Number
114083110
Date Filed
April 21, 2006
0Official Website
Patent Primary Examiner
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US Patent 07410544 Method for cleaning electroless process tank
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07410544
Date of patent
August 12, 2008
Patent application number
11408311
Date Filed
April 21, 2006
Patent primary examiner
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