Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Thomas Ostrom0
Raoul Zerne0
Date of Patent
August 12, 2008
Patent Application Number
10911218
Date Filed
August 4, 2004
Patent Primary Examiner
Patent abstract
The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to producing a layer of a device using the mask or reticle. Particular aspects of the present invention are described in the claims, specification and drawings.
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