Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sadeg M. Faris0
Date of Patent
August 19, 2008
0Patent Application Number
110775420
Date Filed
March 10, 2005
0Patent Primary Examiner
Patent abstract
A lithography device includes one or more conductive strips monolithically embedded within an insulative structure. A method of manufacturing a lithography device includes monolithically forming a conductive strip through an insulative structure. Monolithically forming such a device includes forming the conductive strip on an mixed conductive-insulative layer, and embedding the conductive-insulative layer layer within the insulative structure. Such a device may readily be manufactured, is reliable, and is capable of various lithography applications and other applications requiring sub-micron and nano-scale electrode devices and electrode arrays.
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