Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Daisuke Kawana0
Tomotaka Yamada0
Takayuki Hosono0
Koki Tamura0
Date of Patent
August 26, 2008
Patent Application Number
11091618
Date Filed
March 28, 2005
Patent Primary Examiner
Patent abstract
A positive resist composition capable of forming a resist pattern having excellent shape is provided. This composition is a positive resist composition including a base resin component (A) and an acid generator component (B) generating an acid under exposure, which are dissolved in an organic solvent, wherein the base resin component (A) is a silicone resin, and the organic solvent contains propylene glycol monomethyl ether (x1) and a solvent (S2) having a boiling point higher than that of the propylene glycol monomethyl ether.
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