US Patent 7422927 Methods of forming a resistance variable element
Patent 7422927 was granted and assigned to Micron Technology on September, 2008 by the United States Patent and Trademark Office.
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The invention includes methods of depositing silver onto a metal selenide-comprising surface, and methods of forming a resistance variable device. In one implementation, a method of depositing silver onto a metal selenide-comprising surface includes providing a deposition chamber comprising a sputtering target and a substrate to be depositing upon. The target comprises silver, and the substrate comprises an exposed surface comprising metal selenide. Gaseous cesium is flowed to the target and a bombarding inert sputtering species is flowed to the target effective to sputter negative silver ions from the target. The sputtered negative silver ions are flowed to the exposed metal selenide-comprising surface effective to deposit a continuous and completely covering silver film on the exposed metal selenide of the substrate.
US Patent 07422927 Methods of forming a resistance variable element US Patent 7422927 Methods of forming a resistance variable element
US Patent 07422927 Methods of forming a resistance variable element
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